Implants with Gaussian Profile GI-XRF Calculations

You can use this web page to calculate fluorescent intensity as a function of the glancing incident angle

IMPLANT

Implant chemical formula:
Implant Atomic Number:
Implant Atomic Weight: g/moll
Implant Density: g/cm³
Implant Width (w): Å
Implant concentration peak position (z₀): Å
Implant relative concentration peak value (C₀):

SUBSTRATE

Substrate chemical formula:
Substrate Atomic Number:
Substrate Atomic Weight: g/moll
Substrate Density: g/cm³

PXR

Primary X-Ray wavelength: Å
Atomic Scattering Factor for Layer material: real and imaginary
Atomic Scattering Factor for Substrate material: real and imaginary

Input Explanation

General

All data should be provided. For elements form Ti through As input data already provided for K α line. You need Javascript enabled to use this feature. You are free to change any of this data to what you want.

The Atomic Scattering Factor

The real part of atomic scattering factor is subdivided into two fractions - atomic number and correction. These data available on B.L. Henke, E.M. Gullikson, and J.C. Davis, X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30000 eV, Z=1-92, Atomic Data and Nuclear Data Tables 54 no.2, 181-342 (July 1993). They are available online at the Center for X-Ray Optics, Berkeley Lab website.

Gaussian Depth Profile

C(z)=C₀*Exp{-[(z-z₀)/w]²/2}

Implant Width w realated to Full Width on a Half Maximum FWHM. FHWM = 2 w (2 ln 2)^1/2

Implant concentration peak position z₀

Implant relative concentration peak value C₀

Angle

According to the standard notation for the x-ray analysis the incident and exit angles are measured relative to the surface (NOT the surface normal).

Output

A PNG plot may be generated for quick viewing of the results. If you need anything fancier, the results are provided as a text file for use with your favorite plotting package.