Implants with Gaussian Profile GE-XRF Calculations

You can use this web page to calculate fluorescent intensity as a function of the grazing exit angle

IMPLANT

SUBSTRATE

XRF


Input Explanation

General
All data should be provided. For elements form Ti through As input data already provided for K α line. You need Javascript enabled to use this feature. You are free to change any of this data to what you want.
The Atomic Scattering Factor
The real part of atomic scattering factor is subdivided into two fractions - atomic number and correction. These data available on B.L. Henke, E.M. Gullikson, and J.C. Davis, X-ray interactions: photoabsorption, scattering, transmission, and reflection at E=50-30000 eV, Z=1-92, Atomic Data and Nuclear Data Tables 54 no.2, 181-342 (July 1993). They are available online at the Center for X-Ray Optics, Berkeley Lab website.
Gaussian Depth Profile
C(z)=C0*Exp{-[(z-z0)/w]2/2}
Gaussian Profile
Implant Width w realated to Full Width on a Half Maximum FWHM. FHWM = 2 w (2 ln 2)1/2
Implant concentration peak position z0
Implant relative concentration peak value C0
Angle
According to the standard notation for the x-ray analysis the incident and exit angles are measured relative to the surface (NOT the surface normal).
Output
A PNG plot may be generated for quick viewing of the results. If you need anything fancier, the results are provided as a text file for use with your favorite plotting package.

© Andriy Okhrimomskyy 2006